| 세션명 | Graduate Student Oral Session (I) (English) |
|---|---|
| 발표장 | 301호 |
| 논문코드 | 1O12-6 |
| 발표일 | 2019-10-10 |
| 발표시간 | 14:45-15:00 |
| 논문제목 | A Photoimageable Copolymer System Enabling Perovskite Pattern Formation |
| 발표자 | 안솔 |
| 발표자 소속 | 인하대학교 |
| 저자 | 안솔, 김기민, 형석기1, 이승기1, 신내철, 김명웅† |
| 소속 | 인하대학교; 1KIST |
| 논문초록 | ntial. “Top-down” lithography-based approach is desired for patterning applications; however, it is incompatible with OIHPs due to their poor stability against various solvents used in lithography process. A solution-based approach can be utilized; however, resulting perovskites mostly reveal irregular roughness of film surface, indicating randomly oriented crystal domains with large grain boundaries, which are eventually undesirable to final properties. To address the challenges, we demonstrate CH3NH3PbI3 pattern formation by chemical vapor deposition on photolithographically defined poly(GMA-r-NBOCMA) template system which does not provide problematic chemical moieties to perovskites during the process. Finally, we show photoluminescence and photodetector device studies highlighting the applicability of our pattern formation approach to optoelectronic applications. |
THE POLYMER SOCIETY OF KOREA